Laser Reflectometer Brochure
50kb Acrobat file

• Detects endpoint of dielectric and metal etch

• Focused laser beam for small open areas

• High resolution CCD camera helps to align the beam on the wafer

• Measures etch or deposition thickness for dielectric films

• All solid-state, long life-time components

Adjustable gain and offset for measurements over a wide range of wafer reflectances

Wafer surface display simplifies adjustment of the laser beam position

Compatible with reactors with viewports down to ½" diameter

Two data ports: Analog Output Port and Data Acquisition Port for the PC controller

Digital IO Port interfaces the PC controller start and endpoint triggers

Endpoint detection software uses the rate and threshold algorithms. The rate algorithm measures changes in the dielectric film thickness. The threshold algorithm is sensitive to the changes in the wafer reflectance.

Reflectometer

Beam diameter: < 200 µm

Wafer distance: < 11.5 in

Analog output: 0 - 10 V with adjustable gain end offset

Signal stability: < 0.15 %

CCD Camera

Resolution: < 20 µm

Field of view: <16 mm

B/W video output

Positioning:

X (Y) travel: 13 mm

Minimum increment: 1 µm

Head Dimensions:

2" X 4" X 6".